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China explores alternative EUV light sources beyond ASML approach

Original: China is expanding the definition of the extreme ultraviolet race by investigating alternative EUV light sources rather

China is reportedly broadening its approach to extreme ultraviolet lithography by investigating alternative EUV light sources, rather than solely trying to replicate the ASML platform. According to DigiTimes Asia, the strategy suggests Chinese researchers are pursuing different technical routes to overcome export restrictions on advanced chipmaking equipment.

Why now: Western export controls on advanced lithography tools are pushing China to find independent paths to cutting-edge chip production.

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Evidence

• China is expanding the definition of the extreme ultraviolet race by investigating alternative EUV light sources rather than solely replicating ASML's lithography platform. Source: DigiTimes Asia https://www. digitimes.com/news/a20260924VL… · sipirtu · 1

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